Andrew M.C. Dawes
Senior Staff Engineer in the EDA industry with a background in physics, photonics, and quantum optics. I work at the intersection of modeling, computation, and complex technical systems.
Projects
My projects span optics, electronics, computing, and making. They reflect a mix of past research in light-matter interactions and ongoing interests in technical systems, tools, and hands-on building.
All projectsNews
New Publications on Advanced Lithography
Jan 2025Recent work on displacement Talbot lithography and EUV multilayer defect inspection published in SPIE Proceedings.
Read moreRecent Papers:
- Stefan Rietmann, Zhixin Wang, Kelsey Wooley, Harun Solak, Lawrence Melvin, Andrew M. Dawes, `Comparative simulation analysis of displacement Talbot lithography and projection lithography for high-resolution periodic patterning,’ Proceedings Volume 13687, 136870T (2025).
- Andrew M. Dawes, Joseph Rodriguez, Rafaela Brinn, Safak Sayan, Arvind Sundaramurthy, Guangming Xiao, `Multilayer defects: impact on aerial image through focus,’ Proceedings Volume 13687, 1368712 (2025).
- Chih-I Wei, Chao-Heng Chen, Devesh Thakare, Zachary Levinson, Philip C. Ng, Jirka Schatz, Ulrich Welling, Andrew M. Dawes, Wolfgang Hoppe, Wolfgang Demmerle, Ting-Chun Liu, Juergen Preuninger, Zhiru Yu, Ulrich Klostermann, Soobin Hwang, Perviaz Kareem, Werner Gillijns, `High-NA EUV optical proximity correction modeling flow: from data preparation to model validation,’ Proceedings Volume 13687, 136870Q (2025).